How about the reverse of a technique we used to monitor the thickness of
deposited metal.  We used to use a microscope slide with metal tabs on
the ends.  Then with alligator clips applied to the ends it was simple
to look for the correct resistance that signified the right thickness of
metal.  Just reverse this thinking and look for an increase in
resistance as the metal gets etched in the RIE.  Bill Moffat

________________________________

From: mems-talk-bounces@memsnet.org on behalf of Hakemi, Ghazal [SAS]
Sent: Fri 3/6/2009 4:57 AM
To: mems-talk@memsnet.org
Subject: [mems-talk] CCD in plasma chamber



Dear MEMS colleagues.

I am curious to find a way to monitor the etch rate of my sample inside =
an RIE machine.
Now I have heard of CCDs (used for SEM), but I am not sure whether the =
plasma inside the chamber and the gases would affect the CCD.
Does anybody know what would happen if a CCD is placed in plasma?

Regards.

Ghazal Hakemi