Hi Araya,

Ammonium bifluoride (ABF) is much easier to control. In our experience, diluted
BOE is still quite difficult to control. Better to use ABF only.  Start with 10%
ABF at 30°C and work your way up or down (concentration and temperature) as
indicated by the results.  From your description, I suspect a few %ABF would be
best.

Don Friedrich
JDSU
Don.friedrich@jdsu.com

-----Original Message-----
From: Pothisorn, Araya - potay006
[mailto:Araya.Pothisorn@postgrads.unisa.edu.au]
Sent: Thursday, March 05, 2009 5:56 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] Etching glass without attacking metal

Hi all,

I have a beam structure and would like to release the SAC under the beam. The
beam is 1 micron wide, 100 microns in length and only 0.1 metal film on top of
SIN. The SAC is about 2 microns thick. I plan to use PSG or SOG as SAC. I tried
HF, all metal was gone. I don't have xenon-difluoride dry etch facility. Any
suggestions? please help.

Regards,
Araya