Hello, everyone,
I met the problem when dealing with removal of cured SU-8 with Remover PG.

both SU-8 photoresist (2150) and remover are product of Microchem.

The thickness of SU-8 layer is about 400 microns.

I put the substrate with cured SU-8 , into a petri dish filled with remover,
then ultrasonic with heating (60-70 centigrade degree) was applied, lasting
1hour.
After repeating this twice or three times, some part of SU-8 layer was
delaminated, but no sign of dissolution of cured SU-8 was found.

Does anyone have any idea about this problem? Please give me some advice.

Thanks!

Have a nice day!

郑瑞麟

Ruilin Zheng

Address:
Pen-Tung Sah MEMS Research Center,
Xiamen University, Xiamen,361005,
P.R.China