durusmail: mems-talk: Thick positive photoresist revisited
Thick positive photoresist revisited
2009-03-31
2009-03-31
2009-03-31
2009-04-02
2009-04-02
2009-04-02
Thick positive photoresist revisited
Tolga YELBOGA
2009-04-02
AZ 9200 type resists are very usefull for process of thick positive resist.
Maybe you can prefer other thick resist  (AZ 4562)

Tolga YELBOGA
Project Engineer
Nanotechnology Researh Center
Bilkent University
Bilkent, Ankara 06800 TURKEY
Voice: 90-312-290-1020
http://www.nanointurkey.com
http://www.nanotam.bilkent.edu.tr

-----Original Message-----
From: David Roberts [mailto:dave@prodigysurfacetech.com]
Sent: Thursday, April 02, 2009 8:01 PM
To: tfrisk@kth.se; 'General MEMS discussion'
Subject: Re: [mems-talk] Thick positive photoresist revisited

Hi Thomas,

Plated nickel is used as a DRIE etchmask. 1.)Photolith 2.) Ni plate 10-20um
thick 3.) Strip resist 4.) Strip seed 5.) DRIE

Regards,
Dave
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