Harshal,
HDP-CVD silicon nitride provides great gap fill with less hydrogen content
wet etch resistance to HF not so much
HF resistant PECVD films
(a)SiCN
(a)SiC
(a)Carbon
(a)Si
Best regards'
Glenn

-----Original Message-----
From: Harshal Surangalikar [mailto:s_harshal@yahoo.com]
Sent: Friday, April 17, 2009 12:10 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] Looking for vendors/services for HDP-CVD of
SiliconNitride


Hello,

I am looking for services/vendors in the area of "high density plasma"- CVD
(HDP-CVD) of Silicon Nitride films.

The motivation to go for HDP-CVD is to get higher wet etch resistance
(BOE/Conc. HF) than that provided by the PECVD films. If any info/references
are available on improving wet etch resistance of PECVD films, that will be
very helpful as well.

Thank for the time and best regards,
Harshal Surangalikar.

Sr. MEMS Process Engineer
Fortemedia
Cupertino, CA