Hi All,

I need to deposit a photoresist of thickness about 5um, and pattern it in
order to relize structures of lateral sizes 4x1000um. I tried using AZ9260
photoresist, but i had adhesion problems after development step.
I used HMDS as adhesion promoter.

I also tried to use a O2 plasma before photoresist spinning, but it did
not helped.

Any suggestions to improve photoresist adhesion ?

Best regards,
Andrea