abhay,

I do not think that you can have the expected pattern by the etching with
HCL (8):HNO3 (1) solution. You should move to the other way to etch. I think
that the lift-off is the alternate solution for you.

Regards,
Yoshi

-----Original Message-----
hi,

i am doing platinum etching (200nm). i am using HCL (8):HNO3 (1) solution at
70C>

i am observing lot of non uniform etching behavior and lot of undercutting.
can any one suggest how to avoid this.

-abhay joshi
university of pune