Hi

There is an article published in IEEE MEMS 1998 Proceedings
that deals with SU-8.
 "Taguchi Optimization for the processing Epon SU-8 resist"
 B.Eyre,J.Blosiu and D.Wiberg
 Center for Space Microelectronics Technology
 Jet Propulsion Laboratory
 California Institute of Technology
 Pasadena,CA 91109

Optimized process variables such as softbake time,exposure time,
post-exposure time,develop time and sustrate type for SU-8 with
73% solvent was obtained.

Hope this could be of help.

Regan Nayve


Zeng Yi wrote:
>
> Dear Members:
>      I am new student in MEMS. Now I am concerning to use SU-8
> photoresist for some microstructures. But I do not know how to
> control the depth of the SU-8 layer? Could anyone tell me something
> about that? Thank you for your time and consideration.
> Zeng Yi
>
>