durusmail: mems-talk: Cleaning surfaces particle free
Cleaning surfaces particle free
2009-08-25
2009-08-25
2009-08-26
Cleaning surfaces particle free
Joseph Grogan
2009-08-25
Hello Pavan,

I haven't worked with that resist or stripper, but to start I'd try
using multiple stripper baths. Strip the bulk of the resist in a first
bath (dirty bath), then move the wafers to a fresh bath of stripper
(clean bath) to get any residual junk off. If that doesn't make things
better, I suggest something warm and bubbly with hydrogen peroxide in
it, either SC-1/RCA-1 or piranha. Try SC-1/RCA-1 first, it's safer to
work with than piranha (but still requires standard chemical safety
precautions).

-Joe Grogan

Pavan Samudrala wrote:
> Hello all,
>
> I am stripping AZ resists in AZ400T stripper (immersion based stripping).
> After stripping, I see small particles of resist lying on the wafer. Does
> anyone have a good method of stripping the wafers or cleaning the stripped
> wafers to make it particle free.
>
> The environment I work is not a clean room and will not be particle free.
> But I am trying to reduce the particles on the wafers as much as humanly
> possible.
>
> Regards,
>
> Pavan Samudrala

--
Joseph Grogan
Graduate Student
Department of Mechanical Engineering & Applied Mechanics
University of Pennsylvania
220 South 33rd st
Room 229, Towne Building
Philadelphia PA, 19104
Lab Phone: 215-898-1380

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