Like Grogan said, use different solutions and then move the wafers from one
solution to the other.  If it is still not the result that you want, then use
CARO, which is a mixture of H2O2 and H2SO4 in the ratio 1:3.  That will be able
to remove all residual stuff.  But it is dangerous a to work with CARO when not
in a proper clean room environment.  So you should to discuss with your lab
supervisor to determine if it is ok to do CARO in open air.

I hope this helps,

Nimo

--- On Tue, 8/25/09, Pavan Samudrala  wrote:

From: Pavan Samudrala 
Subject: [mems-talk] Cleaning surfaces particle free
To: "General MEMS discussion" 
Date: Tuesday, August 25, 2009, 12:13 PM

Hello all,

I am stripping AZ resists in AZ400T stripper (immersion based stripping).
After stripping, I see small particles of resist lying on the wafer. Does
anyone have a good method of stripping the wafers or cleaning the stripped
wafers to make it particle free.

The environment I work is not a clean room and will not be particle free.
But I am trying to reduce the particles on the wafers as much as humanly
possible.

Regards,

Pavan Samudrala