Hi Friends,

Does anyone know if it is possible to do LPCVD polysilicon on Borosilicate glass
with LOW CONCENTRATION SILANE GAS; 5% and still keep the reacting temperature at
530°; which is the maximum working temperature of Borosilicate glass.

The process works with this less conctration of silane on normal silicon
substrate at 630°C with increased glass flow and so on...but Borosilicate cannot
be exposed to 630°C.
Any help on previous experience or ideas will be helpful.

thanks in advance
Nimo