Hello everybody,

I have never use Ti/Au as hard mask to wet etch InP-based semiconductor. Now, I
want to have a try.  Could anyone share with me some experiences if you have
done it. The etchant I will use may be H2SO4+H2O2+H2O and HCl+H2O. Will the
Ti/Au be safe in the etchant metioned above?

Thanks in advance.

Regards,
COOLT