Sb deposition by either thermal or sputtering seems to be an extremely
dangerous thing to do. I would exercise caution and talk to safety for
precautions. A face mask I think would be a good thing when you are
cleaning the equipment afterwards.

That is take the temperature of the deposition and divide it by melting
point of antimony is about 0.3 so I don't think that is a problem.
However, antimony has an appreciable vapor pressure at lower
temperatures, so your Sb isn't impinging on a substrate and laying
there. If it is revaporizing you might have all sorts of texturing
phenomenon.

Ed

-----Original Message-----
From: mems-talk-bounces@memsnet.org
[mailto:mems-talk-bounces@memsnet.org] On Behalf Of Harsh Sundani
Sent: Thursday, September 24, 2009 9:03 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] Sb deposition


Hi,

I am trying to deposit Sb on a Si wafer by thermal evaporation.However I
am unable to acheive a good deposition.

Could someone please share their experience about the optimum parameters
to get a fair deposition? Also is sputtering Sb a beter option than
depositing it with the thermal evaporator?

Thanks.

Harsh Sundani