I don't understand your question. If you wanted a rounded sidewall of
photoresist, you can try just to dip it in the developer longer, but it's
impossible to have a good control. As to the bilayer process, check the
manual of LOR series of MicroChem and you will know what it does.

Jie

On Thu, Oct 1, 2009 at 1:42 PM, Andrea Lucibello  wrote:

> Hi all,
>
> Does anyone know if it is possible to planarize photoresist (change its
> shape from square to round)? I know that exist a method called Bilayer
> photoresist process?  How does this process work?
>
> Thanks in advance for the help.
>
> Regards
> A.L

*  Zou Jie (Jay)
*  Department of Physics
*  University of Florida
*  Tel: +1-352-846-8018
*  Email: zoujiepku@gmail.com
*  Homepage: http://plaza.ufl.edu/zoujie/