Hi Andrea,

Based on what the usual results are from reflowing I'm afraid I can't help you
with what the profile is doing- it is rather unexpected though. I believe you
should be able to achieve your shape- you may need careful temperature/time
control to avoid getting a fully domed effect. As for the actual shape of the
profile, how are you measuring it? Those spikes look very reminiscent of some
ghost effects caused by use of SWLI type instruments which can also suffer when
measuring semi transparent resists like the S1818- they're much more trouble at
slightly thinner thicknesses though. If you can try measuring it with a laser
interferometer or on an AFM/in an E-beam system you might see a very different
shape.

Regards,

Daniel

-----Original Message-----
From: Andrea Lucibello [mailto:Nonnini@tiscali.it]
Sent: 04 October 2009 23:11
To: General MEMS discussion
Subject: [mems-talk] Bilayer photoresist process

Hi all,

Here is two links where it is possible to download the files.

http://www.megaupload.com/?d=WEYN1TYI

http://rapidshare.com/files/288737497/File.rar.html

In the folder file.rar there are two files one is a power point of what i am
tring to do, and the other is an article where this process is well explain (in
this article is mentioned a bilayer process planarization). I hope that the ppt
is clear.

Thaks again for the helpfulness.

Regards
Andrea