You can use a thick positive resist such as AZ4620 or AZ9260


On Tue, Oct 13, 2009 at 10:25 AM, Vijay Rajaraman - EWI <
V.Rajaraman@tudelft.nl> wrote:

> Hi All,
>
> I want to etch 100 microns of Si using Bosch DRIE and I'm unable to use
> some well known masking materials such as SiO2/ Al/Al2O3 for specific
> reasons.
>
> So has anyone tried some other masking material than the above with
> reasonable selectivity? For instance, I could think of a spin-on
> material such as resist or SOG ?
>
> Please share your experiences, either in the forum or in person (by
> e-mail). Any tip(s)/suggestion(s) are appreciated.
>
> Thanks,
> Vijay

--
Xiaoguang "Leo" Liu
Birck Nanotechnology Center,
Purdue University,
1205 W.State Street, West Lafayette, IN, 47906 USA
liu79@purdue.edu