Good afternoon,

does anyone here know of a good software package that would allow
calculation of electrons dose (in the context of electron beam
lithography) based on a given exposure layout? I use a Raith e-beam
writer and the software it comes with, allows either setting doses
manually or to automatically adjust for the proximity effect, however
automatic dose adjustment subdivides the pattern into many small
squares causing the exposure time to become unacceptably long. What I
want to try to do it experiment with tuning doses in a pattern and
observing what actual doses I would get.  Of course the simple way of
doing this is to just write the pattern a few times, but for a
complicated pattern that takes many writes and the e-beam writer time
is expensive.

So could anyone recommend some software (free if possible) that would,
at least approximately, calculate the total dose in every spot of a
specified e-beam exposure pattern?

thank you

-mikas