Dear Sebastian,

Are you sure that you developed entire photoresist?
The time between exposure and developing should be sufficiently long, one
hour ore even longer.

Best regards,

Danilo

-----Original Message-----
From: mems-talk-bounces@memsnet.org [mailto:mems-talk-bounces@memsnet.org]
On Behalf Of Y.Tian
Sent: Tuesday, December 08, 2009 1:58 AM
To: General MEMS discussion
Subject: Re: [mems-talk] AZ9260 residue after development

 Hi Sebastian,

why did you use AZ400K developer with 1:2 dilution? Normally it is used at
1:3 or 1:4 proportion. another way i would suggest is to agitate the
developer. Megasonic bath would be a good one, if you are cautious about
your patterns.

Yingtao