Dear All,

i need to do a wet etch of SiN (don't have equipment for dry etch),i read that
it is  possible to do a wet etch with BHF, while using photoresist as etch
mask, but i also read somewhere that the photoresist will last only for a
short period of time (20 min). My SiN layer is 180nm thick. If anyone could
give me more data on this subject i would appreciate it.

Thanks in advance!

A.Tomovic