Hi,

I found this description
www.virginiasemi.com/pdf/siliconetchingandcleaning.pdf
But I never checked the results.

Maria


-----Original Message-----
From: mems-talk-bounces@memsnet.org
[mailto:mems-talk-bounces@memsnet.org] On Behalf Of Andrea Mazzolari
Sent: 24. januar 2010 17:59
To: "General MEMS discussion"@fe.infn.it; "
"@fe.infn.it
Subject: [mems-talk] KOH+IPA

Hi All,

i need to realize (110) oriented vertical sidewalls in (110) silicon
wafers.

I've found that addition of IPA to KOH changes the etch rates and should
provide this result. I do not have any information on the needed IPA
quantity to be addeded to the solution.

Any suggestion, please ?

Thanks,
Andrea