Michael:

Our company is involved with various wet/dry chemical etching techniques,
specifically geared towards MEMS application. We have been conducting
extensive R&D work in the area of selective etching, generating silicon
membranes, maskless implantation technique, FIB based micromachining and FIB
based Ultra high density data-storage techniques. We would be more than
willing to do some work for your company on selective etching of PSG and
other materials. We also have the capability and expertise to build custom
low cost wet chemistry setup. I would really appreciate it if you could send
me more details as to what exactly you are looking for. Thank you and am
looking forward to hearing from you soon.

Regards
Jayant Neogi
**********************************************************
Jayant Neogi
Director: Research and Development
Charged Particle Beam Operations
NORSAM Technologies
Ph#  (503) 640-0586
Fax# (503) 640-8117
************************************************************
-----Original Message-----
From: Pedersen, Michael 
To: MEMS@ISI.EDU 
Date: Monday, October 26, 1998 9:53 AM
Subject: HF Vapor phase etching


>     Dear colleques,
>
>     We are currently looking for any company/university group, who have in
>     their possession a system for HF vapor phase etching of silicon oxide.
>
>     We would like to have some trials run (at cost) on samples of a new
>     sensor structure containing a phosporus-doped silicon oxide
>     sacrificial layer.
>
>     If anyone is interested, or has any advice on where to locate such a
>     system please feel free to contact me.
>
>
>     Michael Pedersen, Ph.D.
>     Research Engineer
>
>     Knowles Electronics Inc.
>     2800 West Golf Road
>     Rolling Meadows, IL 60008
>     USA
>
>     Phone: (847)-437-8090 x334
>     Fax: (847)-437-8144
>     e-mail: michael.pedersen@knowlesinc.com
>
>
>