I do not think you need such thick Cr (you'll have a difficult aspect
ratio). Photolithographic masks normally have only 100nm of Cr which should
block light quite well. They are wet-etched with e.g. Chrome-Etch No.18
(quite cheap).

Ciao
Daniel

* Dr. Daniel Grimm
* IFW Dresden
*            - Institute for Integrative Nanosciences -
* E-Mail:  d.grimm@ifw-dresden.de
* Phone: +49 351 4659-314
* Mobile: +49 177 4926561


-----Original Message-----
From: mems-talk-bounces@memsnet.org [mailto:mems-talk-bounces@memsnet.org]
On Behalf Of Marc Reinig
Sent: Montag, 8. Februar 2010 23:19
To: mems-talk@memsnet.org
Subject: [mems-talk] patterning sub-micron holes in chromium

I would like to place one to several sub-micron holes in a film of chromium
on a glass slide.  The chromium does not have to be very thick, only enough
to block visible light, a few microns thick I think.

Anyone have a recommendation on methods or any services that can provide
this?

Thanks in advance,

Marco