Hello Mike,

You may try to dilute standard positive resist with its solvent (e.g. AZ
1505 with PGMEA (AZ EBR Solvent)) to achieve such low thickness. I am not
sure how good the film quality and coverage is but you may try it.

Best regards,

Daniel Figura
smartfabgroup
process consulting - data processing - fab software
Phone: +44 20 3286 4342
E-mail: daniel.figura@smartfabgroup.com, Web: www.smartfabgroup.com


-----Original Message-----
From: mems-talk-bounces@memsnet.org [mailto:mems-talk-bounces@memsnet.org]
On Behalf Of Michael Cooke
Sent: Monday, February 08, 2010 5:37 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] 50 nm resist

Hi

does any one know of a 50nm positive resist (for use in a standard UV
mask aligner) ?

Thanks
Mike