Hi all,

I have tried different KOH and TMAH solutions at different temperatures
and with different surfactans.

The best solution i have found is taked from this paper:

C. Mihalcea et al., Microelectronic Engineering 57–58 (2001) 781–786

The Si (100) surface appears mirror-like!

Best regards,
Andrea


> Hi All,
>
> i need to etch (100) silicon at low etch rate (not more than 20um/hour)
> and i need very very low roughness.
>
> I can not use HNA solutions, i can use KOH or TMAH with surfactants.
> Any suggestion about the optimal etching condition for this job ?
>
> Thanks,
> Andrea