REGARDING                Liftoff Resist Safety
A popular technique for performing liftoff of hard to etch metals involves
soaking the photoresist in chlorobenzene for 10 minutes between prebake and
exposure. This creates a skin of slowly developing resist and an overhanging
lip after develop which gives clean liftoff. This process is still widely used
in many research labs.

Chlorobenzene is now known as a potential carcinogen and we would like to know
if there are non-toxic or less toxic alternatives for this process. If you know
of any less toxic alternatives, please respond to mems.isi.edu or directly to:

Jonathan Bernstein
Draper Laboratory
Cambridge MA 02139
jbernstein@draper.com

Thank you