What exactly is the failure mode you are experiencing? -----Original Message----- From: mems-talk-bounces+dan.ruiz=honeywell.com@memsnet.org [mailto:mems-talk-bounces+dan.ruiz=honeywell.com@memsnet.org] On Behalf Of li shifeng Sent: Wednesday, March 10, 2010 4:44 PM To: mems-talk@memsnet.org Subject: [mems-talk] Au lift off Hi, All, I pattened 100nm lines on the glass substrate. The height of the line is around 250nm. I used an e-beam evaportor to deposit 5nm Ti and 80nm Au. I found it is very hard to lift off. What are the possible reasons? Any suggestions to succeed with an Au lift off process for smaller patterns? Thanks! Shifeng