I would like to bond Borofloat or 7056 to sputtered 7056 or Borofloat. The wafer
compromises this:

Top layer substrate 7056, Silicon Nitride ion barrier as the bottom layer.

Bottom wafer, sputtered 7056 top layer, possibly a Silicon Nitride under layer,
substrate Aluminium Gallium Arsenide.

I propose to try bonding under vacuum using graphite contact plates and around
450C, 700V.

My question is this:

Will this process work and if so will the glass retain its optical transparency,
I am aware of th Na+ ion migration and the role of the ion barrier trapping
opposing Na and Oxygen, what will happen to the Na when the current is switch of
will it remain as an intermetalic layer or will it re-dissolve in the glass as
Na2O.

But mainly apart from joining I am concerned with optical transparency.

Any comments would be greatly appreciated.


Thanks,

Julian Marsh