I would be concerned with damage to the anti-reflective coating on the mask
due to the oxygen asher. Test a dummy mask first.


Elina Kasman
Process Development Engineer, R&D
Engis Corporation
www.engis.com


>
> ---------- Forwarded message ----------
> From: Andrew Irvine 
> To: General MEMS discussion 
> Date: Fri, 26 Mar 2010 14:04:06 +0000
> Subject: Re: [mems-talk] Cleaning optical masks
> Just to re-visit a wise warning from a recent poster, Piranha etch (at 110C
> or not) is seriously hazardous, and we need to be flagging up safety advice
> when suggesting stuff.
>
> I don't see a problem with using an oxygen asher, and if there is no
> problem (anyone?), do that instead, Mikas!
>
> Andy