Hello, everyone!!!
    I'm looking for an appropriate mask materials for MeV ion implantation.
Because of high energy and dose of the implantation, photoresist is not
the right candidate of the mask materials.
    The implantation mask should have enough thickness to block the
implanted ions. The sidewall of the fabricated pattern of mask should
be steep to ensure an demanded damage profiles.
    Could anybody kindly help me and provide a strategy to satisfy the
ion implantation. Thanks a lot!!!

leiwangsdu
2010-04-01