Look for articles where "high-density plasma CVD" and/or "electron
cyclotron resonant CVD" deposition of SiO2 or SiN is discussed, and
see if any of the institutions there would be reachable or already in
cooperation with yours.

Spero questo ti sia di qualce utilità...


Saluti

On 5/15/10, Andrea Mazzolari  wrote:
> Hi all,
>
> i need to deposit a SiN mask, i can not heat the wafer over 100deg.
> I belive that this can be performed depositing SiN by ICPCVD.
> Is there anyone who could realize this job ?
>
> Best regards,
> Andrea