Hi Harsh,

I once used 1813 as protection material to protect Al film on silicon
substrate. However, I found that after the 1813 protection layer is put into
49% HF for couple of minutes, it becomes hard to remove this photoresist
layer completely. Do you have such problem when using BOE?

Thanks,
-Li

--
Li. Zhang
---------
Graduate Student
Edward P. Fitts Department of Industrial and Systems Engineering
North Carolina State University
Raleigh, NC 27695-7906
USA
Web:  http://www.ise.ncsu.edu
         http://www.nnf.ncsu.edu