I have used patterned 1813 as a protective layer when etching oxide thin
films with 10:1 BOE.  When I'm done etching, I put my samples in 1165 resist
remover.  I can usually see the 1813 resist come off instantly, but I
usually leave it in for a few hours, sometimes overnight, to ensure that all
of the resist is gone.  Hope this helps.

Tony

On Mon, May 24, 2010 at 11:46 PM, Li. Zhang  wrote:

> Hi Harsh,
>
> I once used 1813 as protection material to protect Al film on silicon
> substrate. However, I found that after the 1813 protection layer is put
> into
> 49% HF for couple of minutes, it becomes hard to remove this photoresist
> layer completely. Do you have such problem when using BOE?
>
> Thanks,
> -Li

Tony Price
Department of Electrical Engineering
University of South Florida
4202 E. Fowler Avenue, ENB-118,
Tampa, FL, 33620
Office: ENB 412
Phone: (813) 974-4851
Cell: (404) 291-3506