Hi gary,

You can use simple RIE etching by O2 plasma. But this will remove all the PR, it
is not selective to negative photoresist.

Recipe: O2: 50 sccm, Temp: 25C, Power: 200W. Good luck

Muhammad Qazi
Dept of EE
University of South Carolina
Columbia, SC29208



-----Original Message-----
From: Tingjie Li [mailto:tli243@uwo.ca]
Sent: Thursday, June 17, 2010 11:28 AM
To: mems-talk@memsnet.org
Subject: [mems-talk] isotopic etching of negative photoresist

Hi All,

 Does anyone know how to carry out isotopic etching on negative photoresist?
Thank you so much!

--
Best Regards/
Gary  Li
The University Of Western Ontario
1151 Richmond Street
London, Ontario,Canada
N6A 5B9