Does anyone know of a chemical that will reduce the contact angle of
standard DNQ photoresist on sapphire? Chemically it is quite different
than glass and silicon, so HMDS does not seem to work at all. We are
working with non-rotationally symmetric parts, so trying to get the edge
bead down is very important for good contact during photolith, and
proper exposure control for lift off processes that go to the edge of a
part.



Sincerely,

David Casale
R&D Engineer
www.maxlevy.com 
Max Levy Autograph
2710 Commerce Way
Philadelphia, PA 19154 USA
tel: 215-842-3675