Piranha (in my case 4:1 H2SO4 : 30%H2O2) boils at 160C. It is much more
aggressive at this temperature. (also very dangerous!)


----- original message ----
From: antwi nimo 
To: ameya.g@gmail.com, General MEMS discussion 
Date: 06/23/2010 09:47 AM
Subject: Re: [mems-talk] Removing hard-baked photoresist


A mixture of H2SO4 and H2O2 at a temperature of  ~180celsius can remove
the resist...This solution is used the remove resist when making glass
mask...I am sure it can remove this resist to.....i hope this information
helps,
Nimo