Hi,

maybe, you did not clean completly your wafer before the PECVD
deposition, therefore the Silicone oxide did'nt hang on your wafer

best regards,

Alaa

Andrea Mazzolari a écrit :
> Hi all,
>
> I've tried to use PECVD oxide as etch mask in 74% phosphoric acid heated
> at 130 deg, but it did not work.
>
> In my understanding, silicon oxide should be resistant to phosphoric acid.
>
> So what's wrong ?
>
> Best regards,
> Andrea
>

--
Alaa el dine ALLOUCH
Doctorant au LAAS-CNRS-Groupe N2IS
7 Av colonel Roche, 31077 Toulouse
Tél : 05 61 33 78 71