Hi all:

There is a concern of comparability of NR5 and AZ 50XT resist during the
process. This has been claimed as a root cause of excessive defects such as
bubbles and resist residues at post develop (NR5 coated as thick as 60um on
top of AZ 50XT layer, etch and strip.)

Any idea of reducing these defects is appreciated.

Regards,
Paul