durusmail: mems-talk: lithography fin etch to define silicon NW
lithography fin etch to define silicon NW
2010-08-03
2010-08-03
2010-08-03
2010-08-09
2010-08-09
lithography fin etch to define silicon NW
Bill Moffat
2010-08-03
If you are using a normal exposure to define a square the corners get
exposed from both sides and the corners start to disappear.  Controlled
over exposure can create a circle or close to it.  Bill Moffat.

-----Original Message-----
From: mems-talk-bounces+bmoffat=yieldengineering.com@memsnet.org
[mailto:mems-talk-bounces+bmoffat=yieldengineering.com@memsnet.org] On
Behalf Of Yingnan Wang
Sent: Tuesday, August 03, 2010 7:03 AM
To: mems-talk@memsnet.org
Subject: Re: [mems-talk] lithography fin etch to define silicon NW

Hi Chen,

I think you can round the corners by annealing the silicon NW in
hydrogen.

BR,

YN WANG
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