Darren,

       Lots of questions.  How thick is your resist? What is the process
you are using to try for a reverse slope of your resist edge?  Contact
me directly for lots of papers on lift off techniques.

bmoffat@yieldengineering.com


Bill

-----Original Message-----
From: mems-talk-bounces+bmoffat=yieldengineering.com@memsnet.org
[mailto:mems-talk-bounces+bmoffat=yieldengineering.com@memsnet.org] On
Behalf Of D.Grimm@ifw-dresden.de
Sent: Monday, August 16, 2010 5:45 AM
To: mems-talk@memsnet.org
Subject: Re: [mems-talk] Lift Off

Hi Darren,

indeed, your lithography looks ...hm... not good. I'll guess, no
lift-off possible.

Something is really wrong with your litho. It could be: mask not in
contact with substrate or wrong focus. Too low dosis (looking at 10um
line). Old or contaminated resist/developer. Wrong processing order? Try
to check this first with other users. 10um lines should be very easy to
pattern.

Furthermore, what is you substrate? Could it be that your (alkaline)
developer attacked the substrate?

Best
Daniel