I am seeing a thin film form on photoresist during Cr etch. The film
is difficult to remove. I'm wondering if anyone has encountered this before.

We ebeam evaporate 1000A of Cr on glass and etch in Transene 1020
Chromium etchant. The film is clear.

Someone suggested that it could be an organometallic formed in part by
the Cerium in the etchant.

Rob MacDonald