durusmail: mems-talk: RIE chamber cleaning
RIE chamber cleaning
2010-09-30
2010-09-30
2010-09-30
2010-10-04
RIE chamber cleaning
Jack Ma
2010-10-04
Dear Salam:
  We only have Ar, CHF3 and O2. We don't have chlorine, 'Cause we don't have
the permission to use it in our area.

On Fri, Oct 1, 2010 at 4:22 AM, Salam Gabran  wrote:

>
> Hi,
>
> we use a 3 step clean recipe for the RIE:
>
> 1: Pressure 100, RIE 200W + ICP 200W: 45sccm O2 + 5sccm SF6 @ 10min
> 2: Pressure 100, RIE 200W + ICP 200W: 5sccm O2 + 45sccm SF6 @ 10min
> 3: Pressure 100, RIE 200W + ICP 200W: 45sccm O2 @ 10min
>
> kind regards
>
> Salam R. Gabran, MASc.
> Research associate, PhD. Candidate
> Center for Integrated RF Engineering
> (CIRFE) Group
> ECE Dept., University of Waterloo,
> 200 University Avenue West
> Waterloo, Ontario, N2L3G1
> cell.: 519-729-8066
> Web: www.ece.uwaterloo.ca/~sgabran
>
>
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--
BR.
Zetao, Ma
432-8561
Hamamatsu, Japan
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