I've heard that the basic developer (AZ400K, for example) removes HMDS,
but I've never tested it.

A little oxygen plasma will probably do the job as well.

Jesse Fowler


From:   "Mikael Evander" 
To:     "'General MEMS discussion'" 
Date:   10/20/2010 18:16
Subject:  removal of HMDS without affecting the photoresist

I'm currently working on a microfluidic project using microelectrodes
patterned on glass slides. To test an idea I have, I've patterned the
glass wafers with standard positive photoresist and without thinking much
about it I used our normal routine which involves priming the glass wafer
with HMDS before coating the wafer with resist. Normally that's not a
problem as I remove the resist and clean the glass wafers in NaOH to make
them hydrophilic again. This time I would like to keep the photoresist
intact but still be able to remove the HDMS and make the glass
hydrophilic.

Would you think that's possible or should I simply try to do this with
polyimide or SU8 instead that can withstand solvents a bit better? The
reason for using standard photoresist was to make a simple test without
going into using new materials/instruments etc . might have been a bad
idea :S

Thanks!

/Mikael