After developing the photoresist, a brief O2 plasma
treatment will remove any residual HMDS
if there is even any remaining after development.

The best tests to verify these effects would be to
measure contact angle of your surface prior
to HMDS coat, after HMDS coat, then PR coat,
flood expose, develop - then test contact angle again.
Brief O2 plasma and test contact angle one more time.

This should give you all the info you need to verify your process.

I expect Bill Moffatt at Yield Engineering may weigh in on this also.

Sincerely,
Bill Flounders
Berkeley NanoLab


Shay Kaplan wrote:
> Mikael,
>
> You can't remove the HMDS as it is not a layer coated on a substrate, but
> rather substrate areas that have reacted with HMDS to create a non
> continuous 'monolayer'.
>
> You can try to plasma treat the sample to get it hydrophilic.
>
> shay