durusmail: mems-talk: removal of HMDS without affecting the photoresist
removal of HMDS without affecting the photoresist
2010-10-20
2010-10-21
2010-10-21
2010-10-21
2010-10-22
2010-10-21
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2010-10-26
removal of HMDS without affecting the photoresist
Mikael Evander
2010-10-22
Thanks all, plasma seems to be the easiest and most obvious way for now. Should
have thought of that. I'll try skipping the HMDS next time and see what happens
:)

thanks again


/Mikael

----- Original Message -----
From: "David Casale" 
To: "General MEMS discussion" 
Sent: Thursday, October 21, 2010 9:06:33 AM
Subject: Re: [mems-talk] removal of HMDS without affecting the photoresist

I agree with Gareth, just skip the HMDS prime. You really shouldn't need
it on the glass. I wouldn't even worry about the dehydration step he
said, if you are using a standard positive DNQ resist (like S1800),
adhesion and wettability to glass should be fine and I don't think the
small amount of water vapor in the glass is going to affect much. 95% of
our work is on standard soda lime glass, and we rarely use HMDS.

Sincerely,
David Casale
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