Thanks for your advice.

i will have a try.

BR

Xin Yan



On Thu, Nov 18, 2010 at 5:33 PM, Grimm, Dr. Daniel
wrote:

> Hi Yan Xin,
>
> normally I have not very good results using AZ5214 in HF etching processes
> due to adhesion problems. After some time (~1/2 min), HF tends to lift the
> resist (depending on your surface preparation). Furthermore, AZ5214 is not
> resistant against penetration of HF through the resist - you'll get partly
> exposed surfaces after a couple of minutes.
> We use ARP-3510, or even better, ARP-3100 (both from Allresist) for long HF
> etching processes.
>
> I think you burn your resist at 400°C and you might not be able to remove
> it afterwards.
>
> Best
> Daniel

--
Yan Xin
-Pen-Tung Sah MEMS Research Center,
-Xiamen University, CHINA
XMU HOME:
http://memsc.xmu.edu.cn/mems_renchaiduiwu/XuYuan_Chen-Group/index_1.html