Hello, David,

I am using a chrome etchant from Shipley called Chrome Etchant 18 and it
will need about 2 minutes to etch thin film cr of 200nm. You will not have
any problems with dissolving resist or etching your SiO2.

Oliver Freudenberg

> ----------
> Von:  David Menche[SMTP:dmenche@lightwavemicro.com]
> Antwort an:   David Menche;mems-cc@ISI.EDU
> Gesendet:     Mittwoch, 12. Mai 1999 23:55
> An:   Freudenberg, Oliver
> Betreff:      Chrome etch
>
>
>   We are using chrome as a hard mask to dry etch SiO2.
> What is a good chrome echant that will not attack the photo resist, nor
> SiO2, and what kind of etch rate is expected.   tried potassium
> permaginate/potassium hudroxide solution, and find it is very slow at
> chrome etch, and fast at dissolving the resist.
>
> thanks    dave menche
>
>