David Menche wrote:

>   We are using chrome as a hard mask to dry etch SiO2.
> What is a good chrome echant that will not attack the photo resist, nor
> SiO2, and what kind of etch rate is expected.   tried potassium
> permaginate/potassium hudroxide solution, and find it is very slow at
> chrome etch, and fast at dissolving the resist.
>
> thanks    dave menche
>

Hello,

we have used for submicron wet etching of  Cr
(approx. 100nm Cr / 1 min):

    165g (NH4)2Ce(NO3)6, 43ml 70% HClO4
     +fill up to 1 liter destilated H2O


Best regards,
Ivan Kostic

Tel. +421.7.5941.2557,-.2006,-.3573
http://ups.savba.sk/ebl
___________Bratislava_________________