I am working on Chemical Based Depositions of  thinfilms and trying to get
rid of voids and precipitates deposited on the seeded silicon substrate.
Can anyone suggest me few tips... I have tried annealing for better
charecterization of thinfilms. Is there any other process that i could try
to improve the charecterstics of the thinfilms.

Please post your suggestion. It will be of great help to me.

Thanx