i m using positive photoresist AZP4620 for photolithography. However, during the
development step, the resist layer peels off when washed with DI water; though i
have tried numerous times and have shorten the development time to 20s.

I have cleaned my wafer using piranha solution, followed by DI water rinse, then
rinsing with acetone, IPA, DI water. And then dehydrate my wafer at 120 C for 30
min.

Does HMDS primer helps? if so, what is the recipe for spin coating it?

Regards,
Hui Yan
Mechanical Engineering
National University of Singapore