Hi,

 On page 2 of this document:

   http://www.microchem.com/products/pdf/SU-82000DataSheet2025thru2075Ver4.pdf

you will find that increasing the spin speed will reduce the thickness of the
coated resist.

I hope this helps.

Rgds,
Wutthinan

Thai MicroElectronics Center (TMEC)
http://tmec.nectec.or.th



> Dear everyone,
>
> I am using SU-8 2075 in photolithography. I want to get a thin film after spin
> coating so i intend to use IPA to dilute su-8, but it does not work. Has
anybody
> encountered this problem?  How do you dilute the su-8?
>
> Any suggestion will be highly appreciated.
>
> Thanks in advance.
> Regards